Short Course | Electron Beam Lithography
The Institute for Matter and Systems hosts a hands-on EBL Workshop designed to introduce participants to the full process flow from data preparation to pattern transfer and metallization.
This workshop was sponsored by Elionix.
It will cover:
- Pattern design and data preparation using BEAMER
- High-resolution writing on the Elionix ELS-G100 EBL system
- Pattern transfer using etching techniques
- Metal lift-off processing
Participants gain practical cleanroom experience in high-resolution lithography and processing, applicable to microelectronics, photonics, and quantum device fabrication.
Who should attend: Researchers, students, and industry professionals interested in nanoscale fabrication.
Location: Marcus Nanotechnology building, Georgia Tech
Rates: *Rates include lunches on both days*
- Georgia Tech Rate: $200
- Academic and Government Rate: $400
- Industry Rate: $1000
Our next EBL workshop will take place June 29-30, 2026.
Registration closes June 10, 2026.