Short Course | Electron Beam Lithography
Hosted by the Institute for Matter and Systems at Georgia Institute of Technology, this hands-on workshop offers a deep dive into the complete nanofabrication workflow — from pattern design to pattern transfer and metallization.
The Institute for Matter and Systems (IMS) at Georgia Tech will host a hands-on EBL Workshop designed to introduce participants to the full process flow from data preparation to pattern transfer and metallization.
This workshop will cover:
- Pattern design and data preparation using BEAMER
- High-resolution writing on the Elionix ELS-G100 EBL system
- Pattern transfer using etching techniques
- Metal lift-off processing
Participants will gain practical cleanroom experience in high-resolution lithography and processing, applicable to microelectronics, photonics, and quantum device fabrication.
Who should attend: Researchers, students, and industry professionals interested in nanoscale fabrication.
Location: Marcus Nanotechnology building, Georgia Tech
Rates: *Rates include lunches on both days*
- Georgia Tech Rate: $200
- Academic and Government Rate: $400
- Industry Rate: $1000